D type cavity single target DC magnetron sputtering coater
D type cavity single target DC magnetron sputtering coater is a laboratory-specific coater with two target positions developed by our company. The equipment is equipped with a DC power supply and can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and high speed, high coating rate, low sample temperature rise, and is a typical high-speed and low-temperature sputtering. The magnetron target is equipped with a water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.
This model adopts a target-down layout, with the sample table on the top. The height with the target surface can be accurately adjusted through the program, and it can be heated rotatably, with excellent performance.
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